OptimalJ from Compuware accelerates J2EE development by generating working applications directly from visual models. Through the power of patterns and model-driven application design, OptimalJ decreases the need for extensive coding and design skills, and delivers high productivity and consistency.
"Compuware's innovative development solution enabled us to double the speed of our development process, while maintaining an extremely high level of quality," said Richard Blais, general manager, Locus Systems. "As a result, we have chosen Compuware OptimalJ as our standard platform for J2EE application development."
OptimalJ is a practical implementation of the Model-Driven Architecture (MDA) standard from the Object Management Group (OMG). OptimalJ uses configurable transformations to automatically translate business models into working applications based on J2EE patterns. By generating as much as 80% of an application's code from models, OptimalJ enables organizations to rapidly respond to change, increase development efficiency, and dramatically decrease maintenance costs.
The developer edition is powered by IntelliJ IDEA and focuses on developers responsible for testing designs. The professional edition, meanwhile, is aimed at full development teams and includes modeling and code generation capabilities. The architecture edition is for advanced J2EE architects. In addition to all the features of the professional edition, it includes the pattern-authoring functionality that allows architects to tailor the model transformations to their needs. An example would be to have the business model generate Hibernate objects instead of EJBs for persistence.
One of the most significant improvements with OptimalJ is a user interface designer. As part of the process of modeling a Web interface, developers define pages, add desired widgets to them, and then bind the widgets to the relevant data elements or back end methods. Once a page is modeled, OptimalJ generates JSPs and related code that require little if any editing. The page designer works in conjunction with an improved Web Flow Designer that models page navigation and simplifies production of Struts artifacts.
iWay SAP Adapter provides a standards-based environment that enables SAP R/3 business objects to be used and reused in Java applications. OptimalJ automatically generates all the complex Java plumbing code required to invoke SAP business objects natively via JCA interfaces.
Furthermore, OptimalJ 3.3 can import business requirements captured using SteelTrace's Catalyze. This combination of Catalyze and OptimalJ, gives development teams an integrated, role-based solution for requirements management and enterprise application development that provides realistic methods for sharing critical information within the development process.
OptimalJ is available in a WebLogic 8.1 edition to let architects and developers use OptimalJ as the environment to model applications, convert the model into working Beehive artifacts and then easily test deployment to the WebLogic Server.
